Nuclear reactors, semiconductors to get smarter with next-gen US plasma tech

PPPL's new plasma simulation method enhances stability and efficiency for fusion research and semiconductor manufacturing. Using a particle-in-cell approach, it accurately models low-pressure industrial plasmas, overcoming previous limitations. Key improvements include better energy conservation and electric field calculations. This tool offers deeper insights into plasma behavior, potentially enabling finer chip etching and advancing fusion energy research. It's already being used to study inductively coupled plasmas crucial for industrial processes.